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Lingyao Xie appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.
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We study the behavior of generalized lc pairs with $\mathrm{\textbf b}$-log abundant nef part, a meticulously designed structure on algebraic varieties. We show that this structure is preserved under the canonical bundle formula and sub-adjunction formulas, and is also compatible with the non-vanishing conjecture and the abundance conjecture in the classical minimal model program.
We show that $|mK_X|$ defines a birational map and has no fixed part for some bounded positive integer $m$ for any $\frac{1}{2}$-lc surface $X$ such that $K_X$ is big and nef. For every positive integer $n\geq 3$, we construct a sequence of projective surfaces $X_{n,i}$, such that $K_{X_{n,i}}$ is ample, ${\rm{mld}}(X_{n,i})>\frac{1}{n}$ for every $i$, $\lim_{i\rightarrow+\infty}{\rm{mld}}(X_{n,i})=\frac{1}{n}$, and for any positive integer $m$, there exists $i$ such that $|mK_{X_{n,i}}|$ has non-zero fixed part. These results answer the surface case of a question of Xu.
We improve on the result of Hacon and Witaszek by showing that the MMP for semi-stable fourfolds in mixed characteristic terminates in several new situations. In particular, we show the validity of the MMP for strictly semi-stable fourfolds over excellent Dedekind schemes globally when the residue fields are perfect and have characteristics $p>5$.
Let $(X\ni x,B)$ be an lc surface germ. If $X\ni x$ is klt, we show that there exists a divisor computing the minimal log discrepancy of $(X\ni x,B)$ that is a Kollár component of $X\ni x$. If $B\not=0$ or $X\ni x$ is not Du Val, we show that any divisor computing the minimal log discrepancy of $(X\ni x,B)$ is a potential lc place of $X\ni x$.
The number of singular points on a klt Fano surface $X$ is $\leq 2ρ(X)+2$.
We provide a detailed proof of the validity of the Minimal Model Program for threefolds over excellent Dedekind separated schemes whose residue fields do not have characteristic 2 or 3.