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Keqiang Huang

Keqiang Huang contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2016arXiv

An efficient and compact quantum switch for quantum circuits

The engineering of quantum devices has reached the stage where we now have small scale quantum processors containing multiple interacting qubits within them. Simple quantum circuits have been demonstrated and scaling up to larger numbers is underway. However as the number of qubits in these processors increases, it becomes challenging to implement switchable or tunable coherent coupling among them. The typical approach has been to detune each qubit from others or the quantum bus it connected to, but as the number of qubits increases this becomes problematic to achieve in practice due to frequency crowding issues. Here, we demonstrate that by applying a fast longitudinal control field to the target qubit, we can turn off its couplings to other qubits or buses (in principle on/off ratio higher than 100 dB). This has important implementations in superconducting circuits as it means we can keep the qubits at their optimal points, where the coherence properties are greatest, during coupling/decoupling processing. Our approach suggests a new way to control coupling among qubits and data buses that can be naturally scaled up to large quantum processors without the need for auxiliary circuits and yet be free of the frequency crowding problems.

preprint2014arXiv

Fabrication of superconducting nanowires based on ultra-thin Nb films by means of nanoimprint lithography

Nanoimprint lithography (NIL) is an attractive nonconventional lithographic technique in the fabrication of superconducting nanowires for superconducting nanowire single-photon detectors (SNSPDs) with large effective detection areas or multi-element devices consisting of hundreds of SNSPDs, due to its low cost and high throughput. In this work, NIL was used to pattern superconducting nanowires with meander-type structures based on ultra-thin (~4 nm) Nb films deposited by DC-magnetron sputtering at room temperature. A combination of thermal-NIL and UV-NIL was exploited to transfer the meander pattern from the imprint hard mold to Nb films. The hard mold based on Si wafer was defined by e-beam lithography (EBL), which was almost nonexpendable due to the application of IPS as a soft mold to transfer the patterns to the imprint resist in the NIL process. The specimens fabricated by NIL keep good superconducting properties which are comparable to that by conventional EBL process.