Source author record

Jochen M. Schneider

Explore this author’s publications, collaborators and research topics. This catalog record has not been claimed by its author.

ResearcherUnclaimed source record

Catalog footprint

Research overview

2works
2topics
4close collaborators

Published work

2 publications

preprint2020arXiv

Compatibility of Zr2AlCZr_{2}AlC MAX phase-based ceramics with oxygen-poor, static liquid lead-bismuth eutectic

This work investigates the compatibility of Zr2AlCZr_{2}AlC MAX phase-based ceramics with liquid LBE, and proposes a mechanism to explain the observed local Zr2AlCZr_{2}AlC/LBE interaction. The ceramics were exposed to oxygen-poor (CO≤2.2⋅10−10C_{O}\le2.2 \cdot10^{-10} mass%), static liquid LBE at 500°C for 1000 h. A new Zr2(Al,Bi,Pb)CZr_{2}(Al,Bi,Pb)C MAX phase solid solution formed in-situ in the LBE-affected Zr2AlCZr_{2}AlC grains. Out-of-plane ordering was favorable in the new solid solution, whereby A\textit{A}-layers with high and low-Bi/Pb contents alternated in the crystal structure, in agreement with first-principles calculations. Bulk Zr2(Al,Bi,Pb)CZr_{2}(Al,Bi,Pb)C was synthesized by reactive hot pressing to study the crystal structure of the solid solution by neutron diffraction.

preprint2013arXiv

Bimodal substrate biasing to control γ-Al2O3 deposition during reactive magnetron sputtering

Al2O3 thin films have been deposited at substrate temperatures between 500°C to 600°C by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the energy distribution of the incident ions. The films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR). The film structure being amorphous, nanocrystalline, or crystalline was correlated with characteristic ion energy distributions. The evolving crystalline structure is connected with different levels of displacements per atom (dpa) in the growing film as being derived from TRIM simulations. The boundary between the formation of crystalline films and amorphous or nanocrystalline films was at 0.9 dpa for a substrate temperature of 500°C. This threshold shifts to 0.6 dpa for films grown at 550°C.

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.