Source author record

Job Beckers

Job Beckers appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

2works
2topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2021arXiv

Quantum dot photoluminescence as a versatile probe to visualize the interaction between plasma and nanoparticles on a surface

We experimentally demonstrate that the interaction between plasma and nanometer-sized semiconductor quantum dots (QDs) is directly connected to a change in their photoluminescence (PL) spectrum. This is done by taking in-situ, high resolution, and temporally-resolved spectra of the light emitted by laser-excited QDs on an electrically floating sample exposed to a low pressure argon plasma. Our results show a fast redshift of the PL emission peak indicating the quantum-confined Stark effect due to direct plasma-charging of these nanostructures and the substrate surface, while other plasma-induced (thermal and ion) effects on longer time scales could clearly be distinguished from these charging effects. The presented results and method open up novel pathways to direct visualization and understanding of fundamental plasma-particle interactions on nanometer length scales.

preprint2020arXiv

Addendum to `Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy'

A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy." Journal of Physics D: Applied Physics 52.3 (2018): 034004.). Due to the recent detection and investigation of an additional third decay regime of the afterglow of an extreme ultraviolet photon-induced plasma described in a later article (Platier, B., et al. "Transition from ambipolar to free diffusion in an EUV-induced argon plasma." Applied Physics Letters 116.10 (2020).) there is an additional reason for a minimum number of photons for this approach to work. Near or below this threshold, we explain that the response time of the diagnostic method is a limiting factor. Further, a second limit for the number of photons within a pulse is formalized related to the trapping of highly energetic free electrons.