Source author record

Hiroyasu Katsuno

Hiroyasu Katsuno appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

2works
5topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2021arXiv

Fast improvement of TEM image with low-dose electrons by deep learning

Low-electron-dose observation is indispensable for observing various samples using a transmission electron microscope; consequently, image processing has been used to improve transmission electron microscopy (TEM) images. To apply such image processing to in situ observations, we here apply a convolutional neural network to TEM imaging. Using a dataset that includes short-exposure images and long-exposure images, we develop a pipeline for processed short-exposure images, based on end-to-end training. The quality of images acquired with a total dose of approximately 5 e- per pixel becomes comparable to that of images acquired with a total dose of approximately 1000 e- per pixel. Because the conversion time is approximately 8 ms, in situ observation at 125 fps is possible. This imaging technique enables in situ observation of electron-beam-sensitive specimens.

preprint2021arXiv

Nanometric Turing Patterns: Morphogenesis of a Bismuth Monolayer

Turing's reaction-diffusion theory of morphogenesis has been very successful in understanding macroscopic patterns within complex objects ranging from biological systems to sand dunes. However, this mechanism was never tested against patterns that emerge at the atomic scale, where the basic ingredients are subject to constraints imposed by quantum mechanics. Here we report evidence of a Turing pattern that appears in a strained atomic bismuth monolayer assembling on the surface of NbSe$_2$ subject to interatomic interactions and respective kinetics. The narrow range of microscopic parameters reflected in numerical analysis that observe stripe patterns and domain walls with Y-shaped junctions is a direct consequence of the quantum-mechanically allowed bond-lengths and bond-angles. This is therefore the first demonstration of a dynamically formed Turing pattern at the atomic scale.