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Hiroki Fukuda

Hiroki Fukuda appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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Published work

2 published item(s)

preprint2022arXiv

Determination of the electron trap level in Fe-doped GaN by phonon-assisted conduction phenomenon

We acoustically measured the energy level for thermally activated conduction (TAC) in high-resistivity Fe-doped GaN using the non-contacting antenna-transmission acoustic-resonance method. The acoustic attenuation takes a maximum at a specific temperature, where the TAC is accelerated with the help of phonon energy. The Debye type relaxation is thus observed for acoustic attenuation, and its activation energy (0.54$\pm$0.04 eV) was determined with attenuation measurements at various frequencies and temperatures. This value agrees with the E3 level in GaN, indicating that thermally associated conduction originates from the E3 trap level. We also measured the five independent elastic constants at high temperatures.

preprint2022arXiv

Elastic constant of dielectric nano-thin films using three-layer resonance studied by picosecond ultrasonics

Elastic constants and sound velocities of nm-order thin films are essential for designing acoustic filters. However, it is difficult to measure them for dielectric thin films. In this study, we use a three-layer structure where a dielectric nano-thin film is sandwiched between thicker metallic films to measure the longitudinal elastic constant of the dielectric film. We propose an efficiency function to estimate the optimal thicknesses of the components. We use Pt/NiO/Pt three-layer films for confirming our proposed method. The determined elastic constant of NiO deposited at room temperature is smaller than the bulk value by $\sim$40$\%$. However, it approaches the bulk value as the deposition temperature increases. We also reveal that uncertainty of the elastic constant of the Pt film insignificantly affects the accuracy of the determined elastic constant of NiO in this structure.