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G. Soto

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Published work

2 published item(s)

preprint2012arXiv

Study on the formation and the decomposition of AgN3 and a hypothetical compound ReN3 by using density functional calculations

We present a comparative study between ReN3 and AgN3 by using density functional theory. The ReN3 is a hypothetical compound proposed by us to interpret the Re to Re interplanar spacing of thin films grown by sputtering. Both, the AgN3 as the ReN3, are calculated as positive enthalpy compounds. The enthalpy might give a clue about the spontaneous decomposition of the solid form, but it cannot be interpreted as a restriction of its synthesizability. As from the calculated total-energy, we discuss the route for the formation of AgN3 starting from atomic species in aqueous solution. We propose that their synthesizability is conditioned by the energy of free nitrogen atoms, and the kinetics of reaction. We conclude that the intrinsic stability of a certain atomic arrangement depends only of the equilibrium of atomic forces, and not from the energy value associated with that structure.

preprint2012arXiv

Synthesis of ReN3 thin films by magnetron sputtering

Recently was reported a novel compound between rhenium and nitrogen, announced with ReN2 composition. This compound was synthesized by the high temperature and high pressure method. We found that the diffraction peaks of this compound are in agreement with the x-ray pattern of a rhenium-nitrogen film, under the assumption that the film is oriented on the substrate. The film was prepared by reactive magnetron sputtering, at room temperature, and deposited on a silicon wafer. From the analysis of the diffractograms it could be concluded that both materials share the same structure. By density functional calculation was found that the composition could be ReN3, instead of ReN2, as stated before. The ReN3 fits in the Ama2 (40) orthorhombic space group, and by the existence of N3 anions it should be categorized as an azide; that is, a nitrogen-rich compound. To reach high nitrogen concentrations by sputtering a crucial step is the target-poisoning. Under this regime of deposition is ensured that the compound is formed simultaneously on the substrate and the target. The poisoned target is rarely used because of a reduced sputtering yield, but as shall see, it can be used as a novel synthetic technique.