Researcher profile

Felix Rechberger

Felix Rechberger contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2011arXiv

Dealloying of Platinum-Aluminum Thin Films Part I. Dynamics of Pattern Formation

Applying focused ion beam (FIB) nanotomography and Rutherford backscattering spectroscopy (RBS) to dealloyed platinum-aluminum thin films an in-depth analysis of the dominating physical mechanisms of porosity formation during the dealloying process is performed. The dynamical porosity formation due to the dissolution of the less noble aluminum in the alloy is treated as result of a reaction-diffusion system. The RBS analysis yields that the porosity formation is mainly caused by a linearly propagating diffusion front, i.e. the liquid/solid interface, with a uniform speed of 42(3) nm/s when using a 4M aqueous NaOH solution at room temperature. The experimentally observed front evolution is captured by the normal diffusive Fisher-Kolmogorov-Petrovskii-Piskounov (FKPP) equation and can be interpreted as a branching random walk phenomenon. The etching front produces a gradual porosity with an enhanced porosity in the surface-near regions of the thin film due to prolonged exposure of the alloy to the alkaline solution.

preprint2011arXiv

Dealloying of Platinum-Aluminum Thin Films Part II. Electrode Performance

Highly porous Pt/Al thin film electrodes on yttria stabilized zirconia electrolytes were prepared by dealloying of co-sputtered Pt/Al films. The oxygen reduction capability of the resulting electrodes was analyzed in a solid oxide fuel cell setup at elevated temperatures. During initial heating to 523 K exceptionally high performances compared to conventional Pt thin film electrodes were measured. This results from the high internal surface area and large three phase boundary length obtained by the dealloying process. Exposure to elevated temperatures of 673 K or 873 K gave rise to degradation of the electrode performance, which was primarily attributed to the oxidation of remaining Al in the thin films.