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E. M. Dizhur

E. M. Dizhur appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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cond-mat.mes-hall cond-mat cond-mat.dis-nn cond-mat.mtrl-sci cond-mat.other

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preprint2020arXiv

Reflection of Electrons during Tunneling and an Intersubband Polaron in the 2D Electron System of a Delta-Layer in GaAs

Al-$δ$-GaAs structures are studied where tunneling to one or more subbands of the 2D electron system of a near-surface delta-doped layer is observed. Reflection of electrons at the threshold of the emission of LO-phonon is observed. This phenomenon occurs when a new subband is involved in the tunneling process and when intersubband transitions of the electrons in a 2D-system with the emission of LO-phonon are added to the inelastic tunneling within a single subband. It is shown that, under the conditions of an intersubband polaron resonance, the reflection processes dominate during tunneling into the delta-layer. If, however, tunneling from the delta-layer occurs, the reflection processes are observed when two subbands are occupied.

preprint2005arXiv

Pressure Dependence of the Barrier Height in Tunnel n-GaAs/Au Junctions

The theory of tunnel current-voltage (I-V) characteristics of metal-semiconductor junctions based on the self-consistent solution of Poisson equation allows to get the Schottky-barrier height and the charged impurity concentration directly from the tunneling data. This approach was applied to the analysis of the low temperature experiments on tunneling under pressure up to 3 GPa in a piston-cylinder gauge. Here we present the barrier height versus pressure for heavily doped tunnel junctions and compare the obtained pressure dependence of the Schottky barrier with known behavior of the band gap under pressure taking into account the influence of the L- and X-valleys and DX centers.

preprint2002arXiv

Experimental Study of Pressure Influence on Tunnel Transport into 2DEG

We present the concept and the results of pilot measurements of tunneling in a system {Al/$δ_{Si}$-GaAs} under pressure up to 2 GPa at 4.2 K. The obtained results may indicate the following: the barrier height for {Al/$δ$-GaAs} equals to 0.86 eV at P=0 and its pressure coefficient is $3 meV/kbar$; charged impurity density in the delta-layer starts to drop from $4.5\times 10^{12} cm^{-2}$ down to $3.8\times 10^{12} cm^{-2}$ at about 1.5 GPa; metal-insulator transition may occur in 2DEG at about 2 GPa.

preprint1999arXiv

Weak localization in the 2D metallic regime of Si-MOS

The negative magnetoresistance due to weak localization is investigated in the two-dimensional metallic state of Si-MOS structures for high conductance values between 35 and 120 e^2/h. The extracted phase coherence time is equal to the momentum relaxation time at 10 K but nearly 100 times longer at the lowest temperature. Nevertheless, only weak logarithmic corrections to the conductivity are present in the investigated temperature and concentration range thus proving the absence of strong quantum effects due to electron-electron interaction. From saturation effects of the phase coherence time a lower boundary for spin-orbit scattering of about 200 ps is estimated.