Researcher profile

E. Alves

E. Alves contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2020arXiv

Ion beam modification of magnetic tunnel junctions

The impact of 400 keV $Ar^+$ ion irradiation on the magnetic and electrical properties of in-plane magnetized magnetic tunnel junction (MTJ) stacks was investigated by ferromagnetic resonance, vibrating sample magnetometry and current-in-plane tunneling techniques. The irradiation-induced changes of the magnetic anisotropy, coupling energies and tunnel magnetoresistance (TMR) exhibited a correlated dependence on the ion fluence, which allowed us to distinguish between two irradiation regimes. In the low-fluence regime, $Φ < 10^{14} cm^{-2}$, the parameters required for having a functioning MTJ were preserved: the anisotropy of the FeCoB free layer (FL) was weakly modulated following a small decrease in the saturation magnetization $M_S$; the TMR decreased continuously; the interlayer exchange coupling (IEC) and the exchange bias (EB) decreased slightly. In the high-fluence regime, $Φ > 10^{14} cm^{-2}$, the MTJ was rendered inoperative: the modulation of the FL anisotropy was strong, caused by a strong decrease in $M_S$, ascribed to a high degree of interface intermixing between the FL and the Ta capping; the EB and IEC were also lost, likely due to intermixing of the layers composing the synthetic antiferromagnet; and the TMR vanished due to the irradiation-induced deterioration of the MgO barrier and MgO/FeCoB interfaces. We demonstrate that the layers surrounding the FL play a decisive role in determining the trend of the magnetic anisotropy evolution resulting from the irradiation, and that an ion-fluence window exists where such a modulation of magnetic anisotropy can occur, while not losing the TMR or the magnetic configuration of the MTJ.

preprint2015arXiv

High In-content InGaN layers synthesized by plasma-assisted molecular-beam epitaxy: growth conditions, strain relaxation and In incorporation kinetics

We report the interplay between In incorporation and strain relaxation kinetics in high-In-content InxGa1-xN (x = 0.3) layers grown by plasma-assisted molecular-beam epitaxy. For In mole fractions x = 0.13-0.48, best structural and morphological quality is obtained under In excess conditions, at In accumulation limit, and at a growth temperature where InGaN decomposition is active. Under such conditions, in situ and ex situ analysis of the evolution of the crystalline structure with the growth thickness points to an onset of misfit relaxation after the growth of 40 nm, and a gradual relaxation during more than 200 nm which results in an inhomogeneous strain distribution along the growth axis. This process is associated with a compositional pulling effect, i.e. indium incorporation is partially inhibited in presence of compressive strain, resulting in a compositional gradient with increasing In mole fraction towards the surface.