Researcher profile

David B. Graves

David B. Graves contributes to research discovery and scholarly infrastructure.

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Published work

3 published item(s)

preprint2014arXiv

Simulating the dynamics of complex plasmas

Complex plasmas are low-temperature plasmas that contain micrometer-size particles in addition to the neutral gas particles and the ions and electrons that make up the plasma. The microparticles interact strongly and display a wealth of collective effects. Here we report on linked numerical simulations that reproduce many of the experimental results of complex plasmas. We model a capacitively coupled plasma with a fluid code written for the commercial package comsol. The output of this model is used to calculate forces on microparticles. The microparticles are modeled using the molecular dynamics package lammps, which we extended to include the forces from the plasma. Using this method, we are able to reproduce void formation, the separation of particles of different sizes into layers, lane formation, vortex formation, and other effects.

preprint2013arXiv

Collective effects in vortex movements in complex (dusty) plasmas

We study the onset and characteristics of vortices in complex (dusty) plasmas using two-dimensional simulations in a setup modeled after the PK-3 Plus laboratory. A small number of microparticles initially self-arranges in a monolayer around the void. As additional particles are introduced, an extended system of vortices develops due to a non-zero curl of the plasma forces. We demonstrate a shear-thinning effect in the vortices. Velocity structure functions and the energy and enstrophy spectra show that vortex flow turbulence is present that is in essence of the "classical" Kolmogorov type.

preprint2009arXiv

Molecular Dynamics for Low Temperature Plasma-Surface Interaction Studies

The mechanisms of physical and chemical interactions of low temperature plasmas with surfaces can be fruitfully explored using molecular dynamics (MD) simulations. MD simulations follow the detailed motion of sets of interacting atoms through integration of atomic equations of motion, using inter-atomic potentials that can account for bond breaking and formation that result when energetic species from the plasma impact surfaces. This article summarizes the current status of the technique for various applications of low temperature plasmas to material processing technologies. The method is reviewed, and commonly used inter-atomic potentials are described. Special attention is paid to the use of MD in understanding various representative applications, including tetrahedral amorphous carbon film deposition from energetic carbon ions; the interactions of radical species with amorphous hydrogenated silicon films; silicon nano-particles in plasmas; and plasma etching.