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Dae Seok Kim

Dae Seok Kim appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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Published work

2 published item(s)

preprint2016arXiv

Fast Fabrication of Sub-200-nm Nanogrooves using Liquid Crystal Material

Self-assembly of soft materials attracts keen interest for patterning applications owing to its ease and spontaneous behavior. We report the fabrication of nanogrooves using sublimation and recondensation of liquid crystal (LC) materials. First, well-aligned smectic LC structures are obtained on the micron-scale topographic patterns of the microchannel; then the sublimation and recondensation process directly produces nanogrooves having sub-200-nm scale. The entire process can be completed in less than 30 min. After it is replicated using an ultraviolet-curable polymer, our platform can be used as an alignment layer to control other guest LC materials.

preprint2015arXiv

Controlling Gaussian and mean curvatures at microscale by sublimation and condensation of smectic liquid crystals

Soft materials with layered structure such as membranes, block copolymers, and smectics exhibit intriguing morphologies with nontrivial curvatures. We report on restructuring the Gaussian and mean curvatures of smectic A films with free surface in the process of sintering, i.e. reshaping at elevated temperatures. The pattern of alternating patches of negative, zero, and positive mean curvature of the air-smectic interface has a profound effect on the rate of sublimation. As a result of sublimation, condensation, and restructuring, initially equilibrium smectic films with negative and zero Gaussian curvature are transformed into structures with pronounced positive Gaussian curvature of layers packing, seldom seen in samples obtained by cooling from the isotropic melt. The observed relationship between the curvatures, bulk elastic behaviour, and interfacial geometries in sintering of smectic liquid crystals paves the way for new approaches to control soft morphologies at micron and submicron scales.