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Researcher profile

D. D. VVedensky

D. D. VVedensky contributes to research discovery and scholarly infrastructure.

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cond-mat.mtrl-scicond-mat.mes-hall

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Published work

3 published item(s)

preprint2014arXiv

Unusual nanostructures of "lattice matched" InP on AlInAs

We show that the morphology of the initial monolayers of InP on Al0.48In0.52As grown by metalorganic vapor-phase epitaxy does not follow the expected layer-by-layer growth mode of lattice-matched systems, but instead develops a number of low-dimensional structures, e.g., quantum dots and wires. We discuss how the macroscopically strain-free heteroepitaxy might be strongly affected by local phase separation/alloying-induced strain and that the preferred aggregation of adatom species on the substrate surface and reduced wettability of InP on AlInAs surfaces might be the cause of the unusual (step) organization and morphology

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preprint2013arXiv

Transient and self-limited nanostructures on patterned surfaces

Site-controlled quantum dots formed during the deposition of (Al)GaAs layers by metalorganic vapor-phase epitaxy on GaAs(111)B substrates patterned with inverted pyramids result in geometric and compositional self-ordering along the vertical axis of the template. We describe a theoretical scheme that reproduces the experimentally-observed time-dependent behavior of this process, including the evolution of the recess and the increase of Ga incorporation along the base of the template to stationary values determined by alloy composition and other growth parameters. Our work clarifies the interplay between kinetics and geometry for the development of self-ordered nanostructures on patterned surfaces, which is essential for the reliable on-demand design of confined systems for applications to quantum optics.

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preprint2012arXiv

Surface organization of homoepitaxial InP films grown by metalorganic vapor-phase epitaxy

We present a systematic study of the morphology of homoepitaxial InP films grown by metalorganic vapor-phase epitaxy which are imaged with ex situ atomic force microscopy. These films show a dramatic range of different surface morphologies as a function of the growth conditions and substrate (growth temperature, V/III ratio, and miscut angle < 0.6deg and orientation toward A or B sites), ranging from stable step flow to previously unreported strong step bunching, over 10 nm in height. These observations suggest a window of growth parameters for optimal quality epitaxial layers. We also present a theoretical model for these growth modes that takes account of deposition, diffusion, and dissociation of molecular precursors, and the diffusion and step incorporation of atoms released by the precursors. The experimental conditions for step flow and step bunching are reproduced by this model, with the step bunching instability caused by the difference in molecular dissociation from above and below step edges, as was discussed previously for GaAs (001).

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