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Chaun Jang

Chaun Jang appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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Published work

2 published item(s)

preprint2020arXiv

Electrical detection of the inverse Edelstein effect on the surface of SmB$_6$

We report the measurement of spin current induced charge accumulation, the inverse Edelstein effect (IEE), on the surface of a candidate topological Kondo insulator SmB6 single crystal. Robust surface conduction channel of SmB6 has been shown to exhibit large degree of spin-momentum locking, and spin polarized current through an external ferromagnetic contact induces the spin dependent charge accumulation on the surface of SmB6. The dependences of the IEE signal on the bias current, an external magnetic field direction and temperature are consistent with the anticlockwise spin texture for the surface band in SmB6 in the momentum space, and the direction and magnitude of the effect compared with the normal Edelstein signal are clearly explained by the Onsager reciprocal relation. Furthermore, we estimate spin-to-charge conversion efficiency, the IEE length, as 4.46 nm that is an order of magnitude larger than the efficiency found in other typical Rashba interfaces, implying that the Rashba contribution to the IEE signal could be small. Building upon existing reports on the surface charge and spin conduction nature on this material, our results provide additional evidence that the surface of SmB6 supports spin polarized conduction channel.

preprint2010arXiv

High-fidelity conformation of graphene to SiO2 topographic features

Strain engineering of graphene through interaction with a patterned substrate offers the possibility of tailoring its electronic properties, but will require detailed understanding of how graphene's morphology is determined by the underlying substrate. However, previous experimental reports have drawn conflicting conclusions about the structure of graphene on SiO2. Here we show that high-resolution non-contact atomic force microscopy of SiO2 reveals roughness at the few-nm length scale unresolved in previous measurements, and scanning tunneling microscopy of graphene on SiO2 shows it to be slightly smoother than the supporting SiO2 substrate. Quantitative analysis of the competition between bending rigidity of the graphene and adhesion to the substrate explains the observed roughness of monolayer graphene on SiO2 as extrinsic, and provides a natural, intuitive description in terms of highly conformal adhesion. The analysis indicates that graphene adopts the conformation of the underlying substrate down to the smallest features with nearly 99% fidelity.