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Benjamin P. Haley

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Published work

2 published item(s)

preprint2015arXiv

Atomistic simulations of amorphous polymers in the cloud with PolymerModeler

Molecular dynamics (MD) simulations enable the description of ma- terial properties and processes with atomistic detail by numerically solv- ing the time evolution of every atom in the system. We introduce Poly- merModeler, a general-purpose, online simulation tool to build atomistic structures of amorphous polymers and perform MD simulations on the re- sulting configurations to predict their thermo-mechanical properties. Poly- merModeler is available, free of charge, at nanoHUB.org via an interactive web interface, and the actual simulations are performed in the cloud us- ing nanoHUB.org resources. Starting from the specification of one or more monomers PolymerModeler builds the polymer chains into a simulation cell with periodic boundary conditions at the desired density. Monomers are added sequentially using the continuous configuration bias direct Monte Carlo method, and copolymers can be created describing the desired se- quence of monomers. PolymerModeler also enables users to perform MD simulations on the structures created by the builder using the Dreiding force field and Gasteiger partial atomic charges. We describe the force field im- plementation and the various options for the MD simulations that use the LAMMPS simulator. PolymerModeler MD simulations for a PMMA sam- ple show good structural agreement with experiments and are in good agree- ment with simulations obtained with commercial software.

preprint2004arXiv

Vacancy assisted arsenic diffusion and time dependent clustering effects in silicon

We present results of kinetic lattice Monte Carlo (KLMC) simulations of substitutional arsenic diffusion in silicon mediated by lattice vacancies. Large systems are considered, with 1000 dopant atoms and long range \textit{ab initio} interactions, to the 18th nearest lattice neighbor, and the diffusivity of each defect species over time is calculated. The concentration of vacancies is greater than equilibrium concentrations in order to simulate conditions shortly after ion implantation. A previously unreported time dependence in the applicability of the pair diffusion model, even at low temperatures, is demonstrated. Additionally, long range interactions are shown to be of critical importance in KLMC simulations; when shorter interaction ranges are considered only clusters composed entirely of vacancies form. An increase in arsenic diffusivity for arsenic concentrations up to $10^{19} \text{cm}^{-3}$ is observed, along with a decrease in arsenic diffusivity for higher arsenic concentrations, due to the formation of arsenic dominated clusters. Finally, the effect of vacancy concentration on diffusivity and clustering is studied, and increasing vacancy concentration is found to lead to a greater number of clusters, more defects per cluster, and a greater vacancy fraction within the clusters.