Researcher profile

Anita Kumari

Anita Kumari contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2021arXiv

In-plane anisotropic quantum confinement effect in ultrasmall SnS sheets

Black phosphorus (BP) analogous tin(II) sulfide (SnS) has recently emerged as an attractive building block for electronic devices due to its highly anisotropic response. Two-dimensional (2D) SnS has shown to exhibit in-plane anisotropy in optical and electrical properties. However, the limitations in growing ultrasmall structures of SnS hinder the experimental exploration of anisotropic behavior in low dimension. Here, we present an elegant approach of synthesizing highly crystalline nanometer-sized SnS sheets. Ultrasmall SnS exhibits two distinct valleys along armchair and zig-zag directions due to in-plane structural anisotropy like bulk SnS. We show that in such SnS nanosheet dots, the band gaps corresponding to two valleys are increased due to quantum confinement effect. We particularly observe that SnS quantum dots (QDs) show excitation energy dependent photoluminescence (PL), which originates from the two nondegenerate valleys. Our work may open up an avenue to show the potential of SnS QDs for new functionalities in electronics and optoelectronics.

preprint2010arXiv

Defect Analysis of MCA Wires

As devices continue to scale, imperfections in the fabrication process will have a more substantial impact on the reliability of a system. In Magnetic Cellular Automata (MCA) data is transferred through the coupling of neighboring cells via magnetic force fields. Due to the size of the switching cells, usually of the order of nanometers or smaller, MCA can be sensitive to inherent fabrication defects such as irregular spacing and non-uniform cell structures. Here we investigate conventional electron beam lithography fabrication defects and present a simulation based study on their effects on information propagation in a wire. The study varies the location of the different types of defects throughout the MCA wire under the in influence of a spatial moving clocking field. We demonstrate that with the proposed spatially moving clock the most probable fabrication defects of MCA do not affect the information propagation and the location of the defect does not play a significant role in computation. Thus it is concluded that MCA wires demonstrate significant defect robustness towards realistic electron beam lithography shortcomings.