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Alka A. Ingale

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Published work

2 published item(s)

preprint2016arXiv

Spatially resolved Raman spectroscopy study of uniform and tapered InAs micro-nano wires: Correlation of strain and polytypism

The asymmetric peak at 212 - 218 cm-1 occurring in InAs micro-nano wires is investigated using spatially resolved Raman spectroscopy (SRRS) of uniform, bent and long tapered MNWs grown on a Si (001) substrate. It is attributed to superposition of E2h phonon (wurtzite : WZ) and TO phonon (zinc blende : ZB) of InAs. Polarized and wavelength dependent SRRS establishes the presence of WZ and ZB phases in these MNWs. However, formation of WZ phase for larger diameter InAs MNWs is not commensurate with existing growth mapping studies, which needs to be understood further. Study of several of these MNWs suggest that the fraction of WZ to ZB in a MNW is decided not only by diameter, but also by local growth seeding/conditions leading to either tapered or uniform MNWs formation, although, external growth conditions are same. Variation of these frequencies that from bulk value are correlated to residual stress generated in ZB and WZ phases due to presence of WZ and ZB phases, respectively. Consistently, temperature dependent Raman data shows that there is a measurable contribution of stress to dw/dT, a positive for ZB and negative for WZ phonons, due to difference in their thermal expansions. Further, effective thermal expansion coefficient of WZ InAs in presence of ZB phase is calculated to vary in the range 10 - 19 x 10-6/K from base to tip of a MNW at 80 K, which is not possible to determine otherwise.

preprint2015arXiv

Correlation of size and oxygen bonding at the interface of Si nanocrystal in Si-SiO2 nanocomposite: A Raman mapping study

Si-SiO2 multilayer nanocomposite (NCp) films, grown using pulsed laser deposition with varying Si deposition time are investigated using Raman spectroscopy/mapping for studying the variation of Si phonon frequency observed in these NCps. The lower frequency (LF) phonons (~ 495 - 510 cm-1) and higher frequency (HF) phonons (~ 515 - 519 cm-1) observed in Raman mapping data (Fig. 1A) in all samples studied are attributed to have originated from surface (Si-SiO2 interface) and core of Si nanocrystals, respectively. The consistent picture of this understanding is developed using Raman spectroscopy monitored laser heating/annealing and cooling (LHC) experiment at the site of a desired frequency chosen with the help of Raman mapping, which brings out clear difference between core and surface (interface) phonons of Si nanocrystals. In order to further support our attribution of LF being surface (interface) phonons, Raman spectra calculations for Si41 cluster with oxygen termination are performed which shows strong Si phonon frequency at 512 cm-1 corresponding to the surface Si atoms. This can be considered analogous to the observed phonon frequencies in the range 495 - 510 cm-1 originating at the Si-SiO2 interface (extended). These results along with XPS data show that nature of interface (oxygen bonding) in turn depends on the size of nanocrystals and thus LF phonons originate at the surface of smaller Si nanocrystals. The understanding developed can be extended to explain large variation observed in Si phonon frequencies of Si-SiO2 nanocomposites reported in the literature, especially lower frequencies.