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Researcher profile

A. Wolff

A. Wolff contributes to research discovery and scholarly infrastructure.

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cond-mat.dis-nncond-mat.mes-hallcond-mat.stat-mech

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Published work

3 published item(s)

preprint2016arXiv

Plasma-enhanced chemical vapor deposition of amorphous Si on graphene

Plasma-enhanced chemical vapor deposition of thin a-Si:H layers on transferred large area graphene is investigated. Radio frequency (RF, 13.56 MHz) and very high frequency (VHF, 140 MHz) plasma processes are compared. Both methods provide conformal coating of graphene with Si layers as thin as 20 nm without any additional seed layer. The RF plasma process results in amorphization of the graphene layer. In contrast, the VHF process keeps the high crystalline quality of the graphene layer almost intact. Correlation analysis of Raman 2D and G band positions indicates that Si deposition induces reduction of the initial doping in graphene and an increase of compressive strain. Upon rapid thermal annealing the amorphous Si layer undergoes dehydrogenation and transformation into a polycrystalline film whereby a high crystalline quality of graphene is preserved.

0 citations0 reviewsNo code linkedOpen access
preprint2011arXiv

Diffusion-limited reactions on disordered surfaces with continuous distributions of binding energies

We study the steady state of a stochastic particle system on a two-dimensional lattice, with particle influx, diffusion and desorption, and the formation of a dimer when particles meet. Surface processes are thermally activated, with (quenched) binding energies drawn from a \emph{continuous} distribution. We show that sites in this model provide either coverage or mobility, depending on their energy. We use this to analytically map the system to an effective \emph{binary} model in a temperature-dependent way. The behavior of the effective model is well-understood and accurately describes key quantities of the system: Compared with discrete distributions, the temperature window of efficient reaction is broadened, and the efficiency decays more slowly at its ends. The mapping also explains in what parameter regimes the system exhibits realization dependence.

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preprint2010arXiv

Diffusion-limited reactions on a two-dimensional lattice with binary disorder

Reaction-diffusion systems where transition rates exhibit quenched disorder are common in physical and chemical systems. We study pair reactions on a periodic two-dimensional lattice, including continuous deposition and spontaneous desorption of particles. Hopping and desorption are taken to be thermally activated processes. The activation energies are drawn from a binary distribution of well depths, corresponding to `shallow' and `deep' sites. This is the simplest non-trivial distribution, which we use to examine and explain fundamental features of the system. We simulate the system using kinetic Monte Carlo methods and provide a thorough understanding of our findings. We show that the combination of shallow and deep sites broadens the temperature window in which the reaction is efficient, compared to either homogeneous system. We also examine the role of spatial correlations, including systems where one type of site is arranged in a cluster or a sublattice. Finally, we show that a simple rate equation model reproduces simulation results with very good accuracy.

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